ICTP200 semiconductor intelligent cryopump

The ICTP200 Semiconductor Intelligent Cryopump is a state-of-the-art vacuum solution engineered specifically for the semiconductor industry. This advanced cryopump is designed to provide superior vacuum performance with intelligent system controls, ensuring optimal process consistency and efficiency. Capable of handling high gas loads, it delivers rapid attainment of vacuum levels, crucial for processes such as etching and deposition. Its compact design and smart features make it an ideal choice for semiconductor manufacturing facilities, enhancing productivity and yield.

Product Advantages:

1. Enhanced Hydrogen Pumping Speed: The ICTP200 is specifically optimized for tool throughput, offering improved hydrogen pumping speed which is essential in ion implant processes to maximize product yield and tool availability.

2. Intelligent Self-Adjusting Technology: This cryopump features a variable speed motor and control system that automatically adjusts for changing heat/gas loading conditions, resulting in enhanced vacuum consistency and improved inter-wafer recovery time.