ICTP500 semiconductor intelligent cryopump

The ICTP500 Semiconductor Intelligent Cryopump is a robust vacuum solution designed to cater to the stringent requirements of the semiconductor industry. Engineered for high performance, this cryopump is equipped to handle the demanding processes such as film deposition, ion implantation, and physical vapor deposition. With its advanced cryogenic technology, it ensures efficient pumping of gases, including hydrogen, which is critical in semiconductor manufacturing. The ICTP500 is known for its high pumping speed, large gas capacity, and the ability to operate in corrosive process environments, making it a reliable choice for maintaining vacuum integrity in semiconductor processes.

 

Product Advantages

 

1. High Pumping Speed and Large Gas Capacity: The ICTP500 boasts a high pumping speed and large gas capacity, which are essential for handling the gas loads generated during semiconductor manufacturing processes. This feature contributes to faster cycle times and improved throughput, enhancing the overall efficiency of the production line.

 

2. Corrosive Gas Tolerance: Designed with corrosion preventive materials, the ICTP500 is capable of withstanding corrosive gases often encountered in semiconductor processes. This resistance to corrosion extends the pump's service life and reduces maintenance requirements, ensuring reliable operation even in the most challenging conditions.