ICTP250 semiconductor intelligent cryopump

The ICTP200W Semiconductor Intelligent Cryopump is a sophisticated vacuum solution tailored for the semiconductor industry. This cryopump is engineered to deliver high vacuum pumping speeds, particularly for hydrogen, which is a critical byproduct in ion implantation processes. It is designed to maximize tool availability and product yield by providing consistent vacuum pumping performance. With an inner diameter of 10 inches (250mm), the ICTP200W is capable of handling the harsh conditions of semiconductor manufacturing with precision and reliability.

Product Advantages:

1. Optimized Hydrogen Pumping Speed: The ICTP200W is specifically designed to optimize tool throughput by improving hydrogen pumping speed, which is essential for maintaining high product yield in semiconductor processes. This feature helps to counteract the impact of hydrogen gas on tool throughput and product quality.

2. Intelligent Self-Adjusting Technology: This cryopump utilizes intelligent system controls that automatically adjust for changing heat and gas loading conditions. This technology ensures better process quality, vacuum consistency, and uptime. The variable speed motor and control system also contribute to reduced vibration, leading to improved inter-wafer recovery time and enhanced overall performance.